Application: Wafer Scan, Surface Inspection, AOI
With µm resolution of 3µm this system is a ready to use configuration for your inspection task. It can be synchronized with a linear stage. The z-stage can adjust the focus with µm accuracy. A second camera with an area sensor is mounted via a beam splitter. It can be used to adjust illumination and exposure without the need of moving the device. The system can be complemented with xy-stage and/or the software for image acquisition and image data processing. An 8″ wafer can be scanned in <3 minutes including real time data processing.
High Resolution Line Scan System
